High Dielectric Constant Materials: VLSI MOSFET Applications (Springer Series in Advanced Microelectronics)
Howard Huff, David Gilmer
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology.
种类:
年:
2004
出版:
1
出版社:
Springer
语言:
english
页:
723
ISBN 10:
3540210814
ISBN 13:
9783540210818
文件:
PDF, 9.60 MB
IPFS:
,
english, 2004
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